| 摘要 |
PURPOSE:To enable a transcribed plate to be miniaturized, by arranging at least two alignment marks on a transcribed plate-mounted stage so that they are located on the inside and upper position of X and Y stages. CONSTITUTION:Two alignment marks 10 and 11 are arranged with a given distance in the direction perpendicular to the X direction on a one-sided peripheral part of the upper plane of a X stage 6 which is arranged on a Y stage 4 and adjusted by moving in the X direction. Respective alignment marks 10 and 11 are formed in white an cross-colored shape by applying a shading film 16 and a resist film 17 on a chip-shaped substrate 15 of a transmitting material which is nearly the same in thickness as the substrate for a transcribed plate 7 and performing definite photolithographic processes. And, these alignment marks 10 and 11 are adjusted so that their positions are respectively united with alignment marks of a photo mask, and then fixed on the X stage 6.
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