发明名称 Method for shadow mask protection during manufacture
摘要 A method is disclosed for use in the manufacture of a color cathode ray tube having a shadow mask with a pattern of minute apertures for color selection. A removable film effective to prevent particle occlusion of the apertures is disposed on at least one side of the mask. The film has an extremely small, substantially uniform thickness dimension, a low index of refraction, and is of such high transparency as to exhibit a negligible optical effect during photoscreening operations.
申请公布号 US4680196(A) 申请公布日期 1987.07.14
申请号 US19860852067 申请日期 1986.04.15
申请人 ZENITH ELECTRONICS CORPORATION 发明人 DIETCH, LEONARD
分类号 H01J9/14;(IPC1-7):B05D5/12 主分类号 H01J9/14
代理机构 代理人
主权项
地址