FORMATION OF CRYSTALLINE THIN FILM

摘要

PURPOSE:To improve the electrical characteristics of a crystalline thin film such as the dielectric breakdown voltage characteristics by forming an amorphous film on the surface of a substrate member before the crystalline thin film is formed on the member by vacuum deposition or other method. CONSTITUTION:An amorphous film 9 of SiO2 or the like is formed on the polished surface 6 of a substrate member 2. A metallic film 4 as a lower electrode is formed on the amorphous film 9 by vacuum deposition, sputtering or other method. A crystalline thin film 3 is then formed on the film 4. A metallic film 5 as an upper electrode is further formed on the film 3 to form a piezoelectric element film 1.