摘要 |
PURPOSE:To precisely measure the degree of accuracy of exposure by a method wherein the distance between the corresponding edges is measured at both ends of the line of the movements in outward and inward directions, and a positional deviation and a rotational deviation are calculated. CONSTITUTION:In the prescribed pattern, the pitches FBLi and BFLi (i=1-n) at the starting point of scanning of the beam indicated at both ends of the scanning region and the pitches FBthetai and BFthetai (i=1-n) at the ending point of scanning of the beam are measured, and the amount of stepping DELTAL of the line and the relation theta deviation DELTAthetaR are calculated. As the amount of the line stepping DELTAL and the relative amount of deviation DELTAthetaR are quantified, the deviation theta which is impossible to detect by visual inspection and the deviation of line can be detected by numerical value. Accordingly, the line deviation and the deviation theta can be corrected by performing the parametric adjustment on the beam exposure device based on the amount of the line stepping DELTAL and the relative theta amount of deviation DELTAthetaR.
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