| 摘要 |
PURPOSE:To control a sputtering gaseous pressure with high accuracy by providing gas blow parts for supplying the sputtering gases to sputtering vessels within the prescribed positions in vacuum vessels so that the cross-interference, etc., of the sputtering gases can be eliminated. CONSTITUTION:This sputtering device is formed of plural vacuum pumps 11, 12 disposed apart from each other, the plural vacuum vessels 5-9, the plural sputtering vessels 7, 8 disposed with sputtering electrodes 15, 16 among said vacuum vessels 5-9, the plural gas flow parts 17, 18 and a gas flow rate control means 31 for controlling the flow rate of the gases to be blown therefrom. The above-mentioned blow parts 17, 18 are provided on the pump 11, 12 side with the sputtering vessels 7, 8 in-between.
|
