| 摘要 |
PURPOSE:To draw a pattern precisely on a mask substrate, and to improve production efficiency by using the mask substrate on which a mark for positioning is formed, measuring the position of the mark at every specified time and drawing the pattern by electron beams, making sure the position of the mask substrate. CONSTITUTION:Marks for positioning such as two ones 15 (15a, 15b) are shaped to a section except a pattern formation region 14 by electron beams. The marks 15 for positioning can be formed by exposing only the mark sections in a Cr film 12 shaped onto a glass substrate 11. The areas of the marks 15 for positioning may be formed in not less than the extent that reflected electrons from the marks can be detected accurately, but 1mm<2> or more are desirable in consideration of workability, etc. The positions of the marks 15a and 15b for positioning are measured at every specified time such as two min during the drawing of the pattern. When these relative positions are displaced from predetermined positions, the values of the positions are corrected, and drawing is continued. Accordingly, even when a mask substrate 10 is moved by he expansion and contraction of a holder 2, the position of the pattern is kept accurate.
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