发明名称 X-RAY EXPOSURE APPARATUS
摘要 PURPOSE:To shorten the cycle time of an exposure by detecting the variation in a relative position between a base and a frame by a detector, and deflecting the electron beam of an X-ray source in response to the variation amount by a deflector to transfer without gradation of the exposure even during the variation. CONSTITUTION:A detector 22 mounted on a frame 15 oppositely to a base 7 detects the variation (vibration) of relative position between the base 7 and the frame 15 in two directions with respect to X and Y directions. A deflector 23 for deflecting an electron beam 16 has an X-direction deflecting coil operated by an X-direction variation detector 22 and a Y-direction deflecting coil operated by a Y-direction variation detector 22. The varied values detected by a detector 22a for detecting the X-direction variation amount and a detector 22b for detecting the Y-direction variation amount is converted by a variation amount calculator 24 to the deflection amount of the beam 16. The converted deflection amount, i.e., the value converted to the conversion amount of the position of an X-ray source for radiating an X-ray 27 by emitting the beam 16 to an anode 11 is amplified by deflection amplifiers 25a, 25b, input to X-direction deflector 23a and Y-direction deflector 23b, thereby deflecting the beam 16.
申请公布号 JPS62154624(A) 申请公布日期 1987.07.09
申请号 JP19850294521 申请日期 1985.12.26
申请人 FUJITSU LTD 发明人 YAMABE MASAKI;KITAMURA YOSHITAKA;FURUKAWA YASUO
分类号 H01J35/14;G03F7/20;H01L21/027;H01L21/30 主分类号 H01J35/14
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