发明名称 CHARGED PARTICLE BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To increase the quantity of elements to be picture-drawn per unit time while preventing the manhours for overall picture drawing processes from increasing by a method wherein a buffer memory is divided into multiple regions exceeding three wherein any data can be independently written-in and read-out. CONSTITUTION:A buffer memory 3 is divided into mutually independent multiple regions 3a, 3b, 3c, 3d; and arbitrary one datum out of multiple diagram data A, B, C, D, E, F... stored in a memory 1 is transferred to an arbitrary one region out of multiple regions 3a, 3b, 3c, 3d to be stored therein by a writing-in selective part 6 laid between the buffer memory 3 and a controller 2 and controlled by the controller 2; likewise a reading-out selective part 7 is provided between the buffer memory 3 and an electron beam control signal transmitter 4 to feed an arbitrary one datum out of multiple diagram data A, B, C, D, E, F... stored in an arbitrary one region out of multiple regions 3a, 3b, 3c, 3d of said buffer memory 3 to the electron beam control signal transmitter 4 to constitute the titled device.
申请公布号 JPS62154728(A) 申请公布日期 1987.07.09
申请号 JP19850292661 申请日期 1985.12.27
申请人 HITACHI LTD 发明人 HAYAKAWA HAJIME;MIZUNO FUMIO
分类号 H01L21/027;H01L21/30 主分类号 H01L21/027
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