| 摘要 |
PURPOSE:To make ions collide ceaselessly on the surfaces of members constituting an electrode installed in a processing chamber and to prevent a foreign substance generating source from depositing on the surfaces of said electrode constituent members by a method wherein the electrode is formed into a configuration that the surfaces of the electrode constituent members intersect with the accelerating direction of the ions. CONSTITUTION:In a cathode 2, a placing part 7 for a plurality of wafers 6 is formed, uniformized rings (electrode constituent members) are mounted in the vicinity of said placing part 7 and an electrode cover (electrode constituent member) 9 consisting of such a ceramic as silica (SiO2) or alumina (Al2O3) is mounted on a cathode main body 2a by a bolt (electrode constituent member) 10, while in an anode 3, too, an electrode cover (electrode constituent member) 11 is mounted on the cathode side of an anode main body 3a by a bolt (electrode constituent member) 10a. And the electrode is formed into a configuration that the surfaces of the electrode constituent members intersect with the accelerating direction of ions to be generated during the time of treatment. That is, the side surfaces of the above uniformized rings 8, the side surface of an aperture part 9a in the electrode cover 9 and the side surfaces of a head of the belt 10 are formed in a state that the taper angles to the cathode surface are acute.
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