| 摘要 |
In a process and apparatus for plasma treatment by the use of a separately provided plasma generating chamber (27) and a treating chamber (30) in which an activated gas excited in the plasma generating chamber is introduced into the treating chamber, the gas is distributed within the treating chamber by means of a gas diffusing plate (25) before being brought into contact with a material to be treated (33). The use of such a diffusing plate can enable more uniform treatment to be carried out. |
