| 摘要 |
PURPOSE:To obtain an exposing position alignment of high accuracy and high speed with the wavelength except an exposing light by the same reticles by altering monochromatic emitting light such as a laser emitted to an image focusing pattern on the reticle to converged, parallel or diverged light in response to the longitudinal aberration of a reducing lens. CONSTITUTION:A circuit pattern 11 drawn on a reticle 1 is emitted by an illumination system 4. Emitted light 41 is transmitted through the circuit pattern of the reticle, reduced by a reducing lens 3 and projected on a chip 20 on a wafer 2. The wafer 2 is stepped and repeated by an X-Y table 7 to print many circuits on the entire wafer. This exposure can be executed many times by replacing the reticles having different circuit patterns until forming one semiconductor circuit. When a parallel beam is emitted from a laser light source 510 by a hyperbolic curve grating 121, a linearly diffracted image is formed. |
