发明名称 DRY TREATMENT OF HALOGEN TYPE WASTE GAS
摘要 <p>PURPOSE:To enhance the removal efficiency of noxious gas by increasing the surface area of soda lime and to prevent the generation of gas having a high acidity by reducing moisture in soda lime, by contacting soda lime preliminarily dehydrated and dried with halogen type waste gas at specific temp. CONSTITUTION:A reaction cylinder 1 is filled with soda lime preliminarily heated and dried under vacuum as a solid treatment agent and heated to 200-300 deg.C by a heater 15. The waste gas formed by diluting halogen type noxious gas 3 such as Cl2, BCl3 or F2 issued from a semiconductor factory with inert gas 2 is passed through the reaction cylinder 1 to remove the noxious gas. By applying dehydration and drying pretreatment to soda lime, free water and combined water contained in soda lime can be reduced and, by preventing that the surface of soda lime is covered with moisture, the surface area of soda lime capable of contacting with waste gas can be largely secured and the generation of gas having high acidity generated by the reaction of the moisture in soda lime wit the noxious gas is preliminarily suppressed make it possible to prevent the deterioration of a treatment apparatus due to corrosion.</p>
申请公布号 JPS62152519(A) 申请公布日期 1987.07.07
申请号 JP19850297598 申请日期 1985.12.26
申请人 IWATANI & CO 发明人 YAGI TAKAO;NOGAMI CHITOSHI;KOIKE KUNIHIKO
分类号 B01D53/68;B01D53/34 主分类号 B01D53/68
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