Rotary drier apparatus for semiconductor wafers

摘要

A rotary drier apparatus for drying semiconductor wafers within a vessel. The rotary drier apparatus has a turntable driven by a motor, support plates mounted on the turntable, cradles suspended pivotally from the support plates with the aid of a rotary shaft, and a stopper for stopping the cradles from touching each other in a nonrotating state. The centers of gravity of the cradles are located outwardly of a portion just under the pivotal axes of the cradles.