发明名称 CHARGED BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To increase beam current for correcting any deflected distortion by a method wherein multiple static lenses in partial regions of a screen lens are irradiated with charged beams by a first deflection means and then pictures are drawn on the material by a second deflecting means. CONSTITUTION:Charged beams 2 are focused on an objective aperture 4 through a focusing lens 3. The beams 2 passing through the aperture 4 are irradiated almost in parallel with the optical axes of multiple static lens in the partial regions of a screen lens 7 by the first deflectors 5. While the second deflectors 6 are impressed with voltage for picture drawing process, the beams 2 are deflected vary rapidly by the first deflector 5 to draw pictures while controlling the blanking of partial regions. The distortion correction by the second deflectors 6 is performed by measuring the distortion from pattern picture-drawn for a test as well as correcting any deflected voltage from mean value. Through these procedures, large current can be supplied by irradiating every partial region with beams 2 to correct any deflected distortion by the second deflecting means.
申请公布号 JPS62152124(A) 申请公布日期 1987.07.07
申请号 JP19850292014 申请日期 1985.12.26
申请人 TOSHIBA CORP 发明人 HATTORI SEIJI
分类号 H01L21/027;H01L21/30 主分类号 H01L21/027
代理机构 代理人
主权项
地址