DEPOSITED FILM FORMING DEVICE

摘要

PURPOSE:To provide a titled device which economizes energy and permits the easy control of film quality by forming a gaseous raw material release pipe and a release pipe for a gaseous halogen oxidizing agent for said raw material into coaxial cylindrical construction and providing gas release holes to the wall surface of the inside pipe. CONSTITUTION:A deposited film is manufactured by using a film forming device shown in the figure. More specifically gaseous SiH4 101 which is the gaseous raw material is introduced from a gas introducing pipe 109 and gaseous F2 103 which is the gaseous halogen oxidizing agent diluted with gaseous He is introduce from a gas introducing pipe 110, respectively into a low port 111. The pressure in a vacuum vessel 120 is reduced down to a prescribed pressure and a substrate 118 made of quartz glass is used. The above-mentioned two gases are passed in the vessel 120 and an Si:H:F film having the film thickness shown in the table 1 is deposited on the substrate 118. The gas introduced into the space sandwiched by the release part 111, inside pipe 111b and outside pipe 111c is passed through the holes 111a provided to the inside pipe 111b in the gas release part 111 to change the flow toward the central direction of the pipe 111b. The gases 110 are thus uniformly and efficiently mixed to react with each other mainly in the release part 111.