| 摘要 |
PURPOSE:To obtain a photomagnetic recording element consisting of a glass substrate having guide grooves of extremely good quality and a process for producing said element by forming the guide grooves consisting of silicon nitride, etc., on one main plane of a glass substrate and covering one main surface of the glass substrate with a recording material so as to cover the guide grooves. CONSTITUTION:The glass substrate 1 consisting of tempered glass is cleaned and a silicon nitride layer is formed thereon as a guide groove forming layer by a sputtering method to the thickness of lambda/4 optical length. A positive type resist is thereafter coated at 4,000rpm rotating speed by a spin coater to form a resist layer. After the resist layer is prebaked, the resist layer is exposed with a spiral mask by using a projection mask aligner, then the resist is subjected to development and post baking. The SiN layer is thereafter etched by a CDE method to form the guide grooves 2. A vertically magnetized layer 4 consisting of TbCo, a protective film 5 consisting of the SiN layer and a reflective layer 6 consisting of aluminum, 'Cobal(R)' alloy or gold are successively and continuously formed to obtain the photomagnetic recording element. The photomagnetic recording element having the guide grooves and having the high quality and high reliability is thus extremely easily obtd. |
