发明名称 CENTRIFUGAL THIN FILM VAPORIZER
摘要 PURPOSE:To regulate the treating performance of the titled centrifugal thin film vaporizer to an optimum in accordance with the kind of material to be treated by placing the leading and position of a rotatable blade provided to a rotary shaft in a heat-transfer surface in a contact or non-contact state with the heat-transfer surface. CONSTITUTION:Eight fixed rods 24 are furnished to a hollow shaft 23 at an angle of 45 deg. to one another in each stage. Besides, a rotary plate 25 which is concentric with the hollow shaft 23 and can be relatively rotated in the circumferential direction is provided in each stage. Supports 26 are also furnished to the rotary plate at an angle of 45 deg. to one another to position a pin 27 which is the center of rotation of the blade 4. Accordingly, when the rotary plate 25 is relatively rotated with respect to the hollow shaft 23, the interval between the blade 4 and the heat-transfer surface 1 is changed. The relative rotation is carried out by rotating a spur gear 33 in the hollow shaft 23. The center of rotation of the blade is moved in accordance with the material which can be an aq. soln. or a slurry, and effective treatment is performed.
申请公布号 JPS62149302(A) 申请公布日期 1987.07.03
申请号 JP19850291365 申请日期 1985.12.24
申请人 HITACHI LTD 发明人 CHINO KOICHI
分类号 G21F9/08;B01D1/22;G21F9/00 主分类号 G21F9/08
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