发明名称 CHEMICAL COPPER PLATING SOLUTION
摘要 PURPOSE:To deposit a flexible copper film by plating with a chemical copper plating soln. in a time corresponding to 1/5-1/6 of the conventional time by adding specified amounts of a nonionic surfactant and a surfactant contg. fluorine to the plating soln. CONSTITUTION:An aqueous soln. contg. a copper salt, a complexing agent, a reducing agent, a pH adjusting agent, a stabilizer and a surfactant is prepd. as a chemical copper plating soln. At this time, 1-50mg/l nonionic surfactant and 10-100mg/l surfactant contg. fluorine are added as the surfactant. A polyoxyethylene deriv. is preferably used as the nonionic surfactant and perfluoroalkylsulfonate or perfluoroalkylcarboxylate as the surfactant contg. fluorine.
申请公布号 JPS62149885(A) 申请公布日期 1987.07.03
申请号 JP19850290069 申请日期 1985.12.23
申请人 TAIYO YUDEN CO LTD 发明人 YOSHIZAWA MUTSUO;KOGURE HIROMICHI
分类号 C23C18/40 主分类号 C23C18/40
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