| 摘要 |
PURPOSE:To produce an electronic parts material having good etchability and workability by specifying the crystal grain size of an alloy compounded with iron Ni, and Cr at specific ratios. CONSTITUTION:An ingot of the alloy contg. 25-45wt% Ni, 0.3-10wt% Cr and consisting of the balance iron and unavoidable impurities is manufactured. After the ingot is subjected to plural passes of rolling-annealing treatments, the ingot is subjected to the final cold rolling treatment at >=40% draft. The cold rolled material is subjected to an annealing treatment at 500-1,200 deg.C then to an adjustment rolling treatment at <=30% draft and further preferably to an annealing treatment at about 200-500 deg.C. The electronic parts material having 6-12 crystal grain size specified in JIS-G0551 is thereby obtd. This electronic parts material is preferably formed with >=80% austenite structure and is aggregated with the crystal orientation at (100). Part of Cr is replaceable with Mn and the rate of substn. is specified to about 0.3-7wt% by the total weight of the alloy. Addition of Co up to max. 7wt% is also possible. |
