发明名称 PRODUCTION OF TARGET MATERIAL FOR SPUTTERING
摘要 PURPOSE:To inexpensively produce a target material having high density, uniform quality, high strength and high dimensional accuracy by packing alloy powder of Sb base, etc., in a case made of an elastic material and vacuum sealing the case, then subjecting the case to uniform pressurization in all directions by a cold hydrostatic press. CONSTITUTION:The raw material powder consisting of Sb base alloy powder and Bi alloy powder is packed into the case made of the elastic material such as rubber, then the case is vacuum-sealed. The above-mentioned powder has grain size of about 60-635 mesh, more preferably about 100-635 mesh range. The case is preferably subjected to a vacuum degassing treatment prior to the above-mentioned vacuum sealing. The vacuum-sealed case is then subjected to uniform pressurization in all directions by the cold hydrostatic press to form the green compact having the high density and uniform quality. The green compact is sintered in an inert atmosphere as necessary to a sintered body and is then machined to the target material for sputtering.
申请公布号 JPS62149827(A) 申请公布日期 1987.07.03
申请号 JP19850290959 申请日期 1985.12.24
申请人 MITSUBISHI METAL CORP 发明人 FUKUSHIMA MASATOSHI;SUEHIRO KOSABURO;FUKUI SOICHI
分类号 B22F3/04;B22F5/00;C22C1/04;C23C14/34 主分类号 B22F3/04
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