| 摘要 |
Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed. |
