| 摘要 |
PURPOSE:To enhance the upper limit of monitor substrate quantity to a large extent, by enabling the highly accurate control of a film thickness in the vapor deposition of a substance with a low refractive index by taking up a polyimide film substrate to be used in a roll form from the outside. CONSTITUTION:A thickness monitor film 1 is mounted to a roll shaped film supply device 2 and connected to a film take-up device 3 through film tensioning auxiliary rolls 4. The device 3 sends an arbitrary amount of the film 1 by a take-up shaft 6 on the basis of the operation from the outside of this apparatus. The whole is covered with a deposition preventing cover 19 having an opening part at the optical measuring part thereof and a part of the film is exposed to the position of said opening part through which a light path 18 passes. This exposed part is heated by a heater 5 determining the vapor deposition condition of the film 1. Because a polyimide film is used as the film 1, said film has a refractive index of 1.78 in a visible region and, in the vapor deposition of a substance with a low refractive index like fluoride, highly accurate control of a film thickness can be performed. The film 1 is taken up little by little to draw out a new film surface and vapor deposition can be alternately performed.
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