| 摘要 |
PURPOSE:To improve the drawing accuracy of electron beam lithography equipment by providing relative height measuring means for drawing field surfaces, and electron beam deflector control means for correcting electron beam deflecting and projecting angles to a rear stage field surface. CONSTITUTION:A central processing unit 9 compares two digital position signals P1 from two drawing field surfaces F1, F2 before and after drawing order to detect the position coordinate difference of both, calculates relative height difference DELTAh between the two field surfaces F1 and F2 on the basis of the position coordinate difference, and decides the electron beam deflecting angle correction amount necessary to move from the field surface F1 of the front stage to the field surface F2 of the rear stage on the basis of the calculated result. The instruction of the correction amount is output as a digital control signal P2, a correction deflecting voltage DELTAV is generated through a D/A converter 10, and applied to an electron beam deflector 2. Since the drawing displacement correction can be accurately performed on the basis of the relatively accurate relative height difference actually measured at drawing field unit in this manner, the drawing accuracy can be improved.
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