| 摘要 |
PURPOSE:To improve the throughput of a charged beam exposure apparatus by providing a main deflection controller, and a sub deflection controller for independently controlling a plurality of sub deflectors corresponding to main deflectors. CONSTITUTION:A first charged beam exposure apparatus splits a plurality of deflectors corresponding to charged beams into main and sub deflectors 108, 107, and provides main deflector controllers 120 for commonly controlling two or more main deflectors, and sub deflector controllers 119 for independently controlling the corresponding sub deflectors. A second charged beam exposure apparatus associates two or more charged beam sources and deflectors in one mirror body 200, provides a plurality of mirror bodies, splits the deflectors into main and sub reflectors, and provides main deflector controllers for common ly controlling two or more main deflectors in the same mirror body and sub deflector controllers for independently controlling the corresponding sub deflectors. Thus, the throughput of the apparatus is improved.
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