发明名称 |
A plasma smelting process for silicon. |
摘要 |
<p>What is disclosed is a process for preparing silicon using a gas plasma as a heat source. The process comprises a) generating a gas plasma in a reactor utilizing a transferred arc plasma configuration in which a minimum of gas is utilized to form a plasma; b) feeding silicon dioxide and a solid reducing agent directly into the reactor and to the plasma; c) passing the plasma gas, the silicon dioxide, and the solid reducing agent into a reaction zone of the reactor; d) recovering molten silicon and the gaseous by-products. </p> |
申请公布号 |
EP0227023(A1) |
申请公布日期 |
1987.07.01 |
申请号 |
EP19860117555 |
申请日期 |
1986.12.17 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
DOSAJ, VISHU DUTT;RAUCHHOLZ, ALVIN WILLIAM |
分类号 |
C01B33/02;C01B33/023;C01B33/025;(IPC1-7):C01B33/02 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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