发明名称 ELECTRODEPOSITION FROM TRIVALENT CHROMIUM BATH
摘要 <p>IMPROVED ELECTRODEPOSITION FROM TRIVALENT CHROMIUM BATH A trivalent chromium electroplating bath is improved by the addition thereto of a small amount of aliphatic sulfonic acid or the salt thereof. The presence of this compound in the bath increases the covering power of the bath and aids in the formation of a uniformly bright deposit. Sodium allyl sulfonate in a concentration between 0.5 and 2 grams/liter has been found to be a satisfactory additive for this purpose. Typically, this compound contains carbon to carbon unsaturation represented by, for example, allyl sulfonic acid, propargyl sulfonic acid, and vinyl sulfonic acid, as well as the alkali metal, ammonium and magnesium salts thereof.</p>
申请公布号 CA1223547(A) 申请公布日期 1987.06.30
申请号 CA19840455299 申请日期 1984.05.28
申请人 HARSHAW/FILTROL PARTNERSHIP 发明人 GIANELOS, LOUIS;HANCHARIK, PAUL J.;SKIMIN, CAROL W.;SNYDER, DONALD L.
分类号 C25D3/06;(IPC1-7):C25D3/06 主分类号 C25D3/06
代理机构 代理人
主权项
地址