FUNCTIONAL DEPOSITED FILM AND MANUFACTURE OF THE SAME

摘要

PURPOSE:To improve a film forming efficiency and an effective material consumption efficiency by a method wherein a raw material compound and activated halogen are mixed in the part near a film forming space when the raw material compound for forming a deposited film and the activated halogen which have chemical reaction with this compound are introduced into the film forming space through separate transfer spaces. CONSTITUTION:An activation species for producing activated halogen such as F2 is introduced into an activation space 202 and an activated halogen is produced by the application of activation energy supplied by a microwave source 206 and introduced into a film forming space 201 through a transfer space 213. On the other hand, a compound A which is raw material of an electrode such as (CH3)3Al or (C2H5)3In is supplied through a transfer space 205 and mixed with the above mentioned activated halogen in the part of the downstream side of the open outlet of the transfer space 205 and mutual chemical reaction is induced. The mixed gas composed of the compound A and the activated halogen is introduced into a film forming space 201 and electrodes 103 are formed on a photoconductive layer 102 which is formed on a substrate 101 beforehand.