APPARATUS FOR FORMING THIN FILM AND METHOD FOR USING SAME

摘要

PURPOSE:To efficiently form a thin film having no defects on a sample by vapor deposition in a vacuum vessel by roughening the surface of the internal structure of the vessel confronting a vapor depositing source so as to reduce the stripping of a film from the inner surface of the vessel. CONSTITUTION:The surface of the internal structure 7 of a vacuum vessel 1 is roughened 10 by sandblast. Fine particles of a thin film forming material 2 are deposited on a sample 5 in the vessel 1. Then the particles of the material 2 deposited on the structure 7 are removed by sandblasting and the surface of the structure 7 is roughened again.