发明名称 |
POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
PURPOSE:To obtain a printing plate having high printing resistance and satisfactory chemical resistance by forming a photosensitive layer contg. novolak resin and the o-naphthoquinonediazidosulfonic ester of polycondensed cresol- formaldehyde resin. CONSTITUTION:A photosensitive layer contg. novolak resin and the o- naphthoquinonediazidosulfonic ester of resin prepd. by polycondensing cresol and/or phenol with aldehyde or ketone is formed on an Al platen having an anodic oxide layer contg. 100-1,000 pores of 200-900Angstrom average diameter per 1mum<2> layer and formed by anodic oxidation in phosphoric acid or an electrolytic soln. contg. phosphoric acid as the principal component. The cresol may be m-, p- or o-cresol but m-cresol is preferably used. Formaldehyde is preferably used as the ketone or aldehyde. Thus, a printing plate having satisfactory cleanability as well as the above-mentioned properties, causing no ground stain and also having wide development latitude can be obtd. |
申请公布号 |
JPS62143056(A) |
申请公布日期 |
1987.06.26 |
申请号 |
JP19850266126 |
申请日期 |
1985.11.28 |
申请人 |
MITSUBISHI CHEM IND LTD;KONISHIROKU PHOTO IND CO LTD |
发明人 |
TOMIYASU HIROSHI;URANO TOSHIYOSHI;SASA NOBUMASA;YAMAMOTO TAKESHI |
分类号 |
B41N3/00;G03C1/72;G03F7/00 |
主分类号 |
B41N3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|