发明名称 POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To obtain a printing plate having high printing resistance and satisfactory chemical resistance by forming a photosensitive layer contg. novolak resin and the o-naphthoquinonediazidosulfonic ester of polycondensed cresol- formaldehyde resin. CONSTITUTION:A photosensitive layer contg. novolak resin and the o- naphthoquinonediazidosulfonic ester of resin prepd. by polycondensing cresol and/or phenol with aldehyde or ketone is formed on an Al platen having an anodic oxide layer contg. 100-1,000 pores of 200-900Angstrom average diameter per 1mum<2> layer and formed by anodic oxidation in phosphoric acid or an electrolytic soln. contg. phosphoric acid as the principal component. The cresol may be m-, p- or o-cresol but m-cresol is preferably used. Formaldehyde is preferably used as the ketone or aldehyde. Thus, a printing plate having satisfactory cleanability as well as the above-mentioned properties, causing no ground stain and also having wide development latitude can be obtd.
申请公布号 JPS62143056(A) 申请公布日期 1987.06.26
申请号 JP19850266126 申请日期 1985.11.28
申请人 MITSUBISHI CHEM IND LTD;KONISHIROKU PHOTO IND CO LTD 发明人 TOMIYASU HIROSHI;URANO TOSHIYOSHI;SASA NOBUMASA;YAMAMOTO TAKESHI
分类号 B41N3/00;G03C1/72;G03F7/00 主分类号 B41N3/00
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