LIGHT IRRADIATION DEVICE

摘要

PURPOSE:To increase and uniformize the intensity of illumination to be irradiated on an element to be processed by a method wherein a stage loaded with an element to be processed is moved to properly change the irradiated position. CONSTITUTION:A light source 7 is lighted and the ultraviolet rays 6 radiated from the light source 7 is converged by a lens 8 to increase the intensity of illumination for irradiating the specified part of a wafer 4. An X-Y stage repeats moving successively by a specified direction and distance and stopping at every specified time interval to irradiate overall surface of wafer 4 with uniform ultraviolet rays 6 so that the surface of wafer 4 coated with photoresist may be hardened efficiently. Through these procedures, the intensity of illumination for photoirradiating the wafer 4 can be increased and uniformized.