发明名称 METHOD AND APPARATUS FOR DEVELOPING PATTERN ON POLYPROPYLENE RESIN SURFACE
摘要 PURPOSE:To inexpensively develop a pattern on a polypropylene resin surface, by subjecting a part in the form of the pattern of the polypropylene resin surface to a plasma treatment, then applying a coating material to the surface, and releasing the thus coated film exclusive of the plasma-treated pattern area. CONSTITUTION:A pattern base 6 provided with a vacuum chamber 8 on the rear side of a pattern 7 is brought into close contact with a polypropylene resin surface 9, and a vacuum pump 11 and a plasma-generating furnace 12 are connected to the vacuum chamber 8. After evacuating an air-tight chamber, a plasma treatment is conducted, thereafter the pattern base 6 is removed, a coating material is applied to the resin surface 9, and is dried. Then, the coated film at parts not subjected to the plasma treatment is released from the resin surface 9 by a water jet, leaving the coated film only at the part subjected to the plasma treatment, whereby the pattern can be developed.
申请公布号 JPS62142678(A) 申请公布日期 1987.06.26
申请号 JP19850284651 申请日期 1985.12.17
申请人 HONDA MOTOR CO LTD 发明人 EBISAWA HIROO;HARA HIROBUMI;MIYAMOTO SHIGEO;NAKAMURA MITSUTERU
分类号 B41M1/30 主分类号 B41M1/30
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