| 摘要 |
PURPOSE:To improve optical sensitivity to a large extent, by providing the optimum reflection preventing film structure against near infrared rays. CONSTITUTION:In order to improve sensitivity for near infrared rays, the thicknesses of an oxide film and a nitride film 5 on the surface of a reverse conductivity type region 3 are controlled, and a reflection preventing film structure is provided. Meanwhile, the thicknesses of oxide films 6 and nitride films 7 on the surface of the same conductivity type region 2 are changed in order that the sensitivity peak does not appear at a part other than the reverse conductivity region 3. Thus a reflecting film structure is obtained. The reflection preventing film is formed by two layers of the oxide film 4(200Angstrom ) and the nitride film 5(850Angstrom ). As the reflecting films, the oxide films 6(4,000Angstrom ) and the nitride films 7(5,000Angstrom ) are formed on the upper surface of the reverse conductivity type region 2. These parts are formed of hour layers.
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