Insulating film for semiconductor, production of the same and liquid composition for producing the same.

摘要

An insulating film for a semiconductor which comprises a cured product of a siloxane prepolymer produced by hydrolyzing and polycondensating (a) a tetraalkoxysilane of the formula: Si(OR<1>)4 (I) (b) an alkyl- or aryl-trialkoxysilane of the formula: R<2>Si(OR<3>)3 (II) (c) an dialkyl- or diaryl-dialkoxysilane of the formula: R<4>R<5>Si(OR<6>)2 (III) in a molar fraction of (a):(b):(c) of 0.14-0.50 : 0.03-0.66 : 0.11-0.66 wherein R<1> to R<6> are the same or different and are alkyl groups having 1 to 6 carbon atoms or aryl groups having 6 to 10 carbon atoms, which has good crack resistance, adhesivity with a substrate and surface evenness.