| 摘要 |
PURPOSE:To make scanning of ion beams themselves unnecessary and omit a mechanical transfer part so as to realize high-speed rotation and scanning of a disk, which are inevitable for large-current ion beam implantation, by utilizing the disc, which is rotated and scanned having a sample, directly as a rotor in an induction motor and then rotating and scanning it. CONSTITUTION:In order to evenly implant ion beams 3 into a sample 5 such as a semiconductor wafer on a disc 4 inside an ion implanting chamber 1a, in a short time while wafer temperature being kept below a fixed value, the disc 4 is highly rotated around an axis and scanned in the diametrical direction. Motor magnets 10 are arranged to rotate the disc 4 directly as a rotor 6 in an induction motor. Arranging motor magnets 10a and 10b in a plural number of induction motors in their diametrical directions and exchanging voltage impressed on power source wirings 20a and 20b enable diametrically directional scanning to be performed because the rotor 6 is absorbed and moved to the motor magnets under operation.
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