发明名称 PHOTOSENSITIVE ELASTOMER COMPOSITION
摘要 PURPOSE:To remarkably improve the thermal stability of a photosensitive elastomer composition and to considerably increase the rate of sensitization by adding a phosphorous ester to the composition consisting of thermoplastic elastomer, an ethylenic unsatd. compound and a photopolymn. initiator. CONSTITUTION:This photosensitive elastomer composition contains thermoplastic elastomer, an ethylenic unsatd. compound, a photopolymn. initiator and a phosphorous ester. The thermoplastic elastomer used may be polystyrene- polybutadiene-polystyrene, the ethylenic unsatd. compound may be ethylene glycol and the photopolymn. initiator may be benzophenone. Triphenyl phosphite is preferably used as the phosphorous ester because it is effective in improving the thermal stability and in increasing the rate of sensitization.
申请公布号 JPS62138845(A) 申请公布日期 1987.06.22
申请号 JP19850277903 申请日期 1985.12.12
申请人 ASAHI CHEM IND CO LTD 发明人 OKUSA TADASHI
分类号 G03C1/00;G03F7/027;G03F7/032 主分类号 G03C1/00
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