发明名称 RASTER SCANNING TYPE ELECTRON BEAM EXPOSURE APPARATUS
摘要 PURPOSE:To obtain a highly accurate minute pattern, by providing an ir radiation-amount modulating means, by which the irradiation amount is changed by every picture element, and correcting the approaching effect. CONSTITUTION:Irradiation amounts, which are imparted to individual picture elements, are stored in an irradiation-amount modulating data memory circuit 11 in a form of integer-number of times of a unit irradiation amount. An irradiation-amount modulating circuit 10 sequentially reads the irradiation- amount modulating data. An electron beam is raster-scanned based on the data. Blanking timing is controlled at the same time. The electron beam is scanned from the left to the right by every one picture element. The irradiation- amount modulating circuit 10 delays the timing, at which the next picture element is moved in correspondence with the irradiation amount modulating data. The irradiation amount modulating circuit 10 controls the blanking so that the electron beam is turned OFF only when the irradiation-amount modulating data is zero.
申请公布号 JPS62137824(A) 申请公布日期 1987.06.20
申请号 JP19850278508 申请日期 1985.12.11
申请人 MITSUBISHI ELECTRIC CORP 发明人 MORIIZUMI KOICHI;SAITO KAZUNORI
分类号 H01L21/027;H01L21/30 主分类号 H01L21/027
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