发明名称 PLASMA TREATMENT DEVICE
摘要 PURPOSE:To improve the activation efficiency of the reactive gas in a reaction chamber by selecting only the gas which forms a long-life metastable excitation species and passing the gas through the 1st plasma generating means. CONSTITUTION:This plasma treatment device is formed of the reaction chamber 1, the 1st plasma generating means 5, 6, a means for conducting the metastable excitation species generated therefrom to the reaction chamber 1, a means for introducing the reactive gas into the reaction chamber 1 and the 2nd plasma generating means 11, 12 for activating said gas. The 1st plasma generating means 5, 6 generate the metastable excitation species of >=10ms life. >=1 kinds of rare gas, nitrogen and oxygen are used as the gas for generating the metastable excitation species.
申请公布号 JPS62136573(A) 申请公布日期 1987.06.19
申请号 JP19850276758 申请日期 1985.12.11
申请人 HITACHI LTD 发明人 TSUJII KANJI;YAJIMA YUSUKE;MURAYAMA SEIICHI
分类号 H01L21/205;C23C8/36;C23C16/50;C23C16/511;H01L21/302;H01L21/31 主分类号 H01L21/205
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