发明名称 METHOD FOR SELECTIVELY REMOVING ADHESIVES FROM POLYIMIDE SUBSTRATES
摘要 <p>Methods for forming holes of predetermined size in polyimide substrates having metallic layers adhesively attached thereto include selectively removing areas of desired size and shape from the metallic layer; contacting the exposed adhesive layer with a selective etchant therefor that does not affect the polyimide substrate or undercut the adhesive near the opening formed; and selectively etching the polyimide substrate exposed in the openings by removal of the adhesive layer overlying the polyimides. These methods permit rapid, efficient formation of holes having a diameter as small as one mil (0.00254 cm).</p>
申请公布号 WO1987003773(A1) 申请公布日期 1987.06.18
申请号 US1986001967 申请日期 1986.09.22
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