PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL

摘要

PURPOSE:To obtain a photosensitive lithographic printing plate material having high mechanical strength and print-resisting power by forming a photosensitive layer contg. a specific polymer and non-photosensitive high-polymer compd. on an Al base of which the sand blasted surface is anodized. CONSTITUTION:The photosensitive layer contg. the following polymer (A) and non-photosensitive high-polymer compd. is formed on the Al base of which the sand blasted surface is anodized. (A) is the o-naphthoquinone diazide sulfonate polymer which is the condensation-polymerized resin of the polyhydroxy phenol and ketone or aldehyde having >=4.10X10<3>wt. average mol. wt. of the backbone polymer and <=8.0 ratio Mw/Mn between the weight average mol. wt. Mw and number average mol. wt. Mn. The content of the polymer (A) is about 10-95(wt.)%, preferably 20-90%, more preferably 25-80%. An alkali- soluble novolak resin is more preferable as the non-photosensitive high-polymer compd. and the content thereof in the entire compsn. of the photosensitive layer is 5-90(wt.)%, more preferably 10-80%.