| 摘要 |
PURPOSE:To form a titled device which is high in the electric power density to be impressed to a substrate part and has high economy by blocking a space where a substrate holder surface faces and a target does not face by partition walls consisting of an insulator so that the apparent exposing area of the substrate holder is decreased. CONSTITUTION:At least part of the space where the surface of the substrate holder 4 of a dielectric bias sputtering device having the carousel type rotary substrate holder 4 faces and the target 3 does not face is blocked by plasma isolating plates 11, 12 consisting of the insulator (quartz plate having about 10mm thickness) to delineate pocket spaces 116, 117. The generation of the plasma in the pocket spaces 116, 117 is thereby suppressed and the apparent exposing surface of the substrate holder 4 is decreased. The dielectric bias sputtering device which is substantially small in the electric power density of the electric power to be impressed to the substrate part 10 and has high economy is thus obtd.
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