| 摘要 |
A novel process for placing a thin film of a metal nitride, e.g. titanium nitride, on a glass substrate by mixing a metal halide with a reducing gas like ammonia, preferably within a range of from about 250.degree.C to 320.degree.C, and then reacting the gases at the surface of a glass substrate heated to, e.g., about 400.degree.C to about 700.degree.C to form the film on the glass. |
