| 摘要 |
PURPOSE:To form a photosensitive resin composition capable of endowing a photocross-linked product with good resistances to solvents and water, and strong adhesion to a printing plate base even in the case of a water-developed type by incorporating a copolymer composed mainly of vinylidene chloride and (meth)acrylic acid or its derivative as the essential component of the photosensitive resin composition. CONSTITUTION:The photosensitive resin compositionis composed essentially of the copolymer composed mainly of vinylidene chloride and (meth)acrylic acid or its derivative, and this composition has affinity to a water-soluble photosensitive polymer composition in a state of aqueous solution, and rich stability, and the film obtained by coating and drying it can well disperse water. Therefore, it can be developed with water, and in addition, the photocross-linked product obtained by exposing said composition is extremely excellent in resistances to solvents and water, and superior in adhesion to the printing plate base, thus permitting printing resistance to various kinds of printing inks to be enhanced remarkably. |
