| 摘要 |
PURPOSE:To enhance oxygen plasma resistance by using the copolymer of a monomer having a vinylsilane bond and a vinyl monomer for constituting the single layer resist, as the upper layer resist of 2-layer structure. CONSTITUTION:The copolymer to be used as the upper layer resist of the 2-layer structure is obtained by polymerizing the monomer having a vinylsilane bond and a substituent bonded to the silicon atom being a 1-3 C alkyl or phenyl group or an H atom, and the organic monomer having a vinyl bond. The homopolymer of this vinyl monomer can be used as the single layer resist. The upper layer resist superior in oxygen plasma resistance is prepared not by mixing the silicone polymer with the resist material, but by using the copolymer of the monomer having the vinylsilane bond and the monomer having vinyl bond and capable of exhibiting superior characteristics as the resist material when it is homopolymerized. |
