发明名称 FORMATION OF VACUUM EVAPORATED METALLIC FILM FOR CATHODE-RAY TUBE
摘要 PURPOSE:To prevent generation of a bad condition owing to foreign matters attached to an intermediate film, by exerting shocks to a panel during the evacuation process, and adding a process of shock to remove impurities and dirt attached over the intermediate film and the like inside the panel. CONSTITUTION:Starting one minute after the starting of evacuation process, shocks of 2-3C are exerted for about 20sec at a frequency of 2 round/sec by a hammer 13 which is formed of a superhard polyethylene. Then, after the evacuation process is over, a metallic film vacuum evaporation process if performed by vacuum-evaporating a metal. In such a process, since impurities generated at the installing and removing of a shadow mask 6 in a phosphor film forming process, and dirt in the air, exfoliated microparticles of the vacuum evaporated metallic film, and the like accumulated in a vacuum envelope 7, which are scattered by a convection produced at the initial phase of the evacuation process, attached to the intermediate film 3, and attached to the inside of the skirt of the panel 1, are removed, the amount of the residual foreign matters attached to the intermediate film 3 and the like can be reduced remarkably.
申请公布号 JPS62133637(A) 申请公布日期 1987.06.16
申请号 JP19850275573 申请日期 1985.12.06
申请人 MITSUBISHI ELECTRIC CORP 发明人 HAYASHI SEIHACHIRO
分类号 H01J9/22;H01J29/28 主分类号 H01J9/22
代理机构 代理人
主权项
地址