| 摘要 |
PURPOSE:To keep a light incident window in such a state that it is always free from a deposit by providing a transparent antisticking plate near to the window part of a light introduction path in the inside of a reaction tank and enabling this antisticking plate to transfer between the reaction tank and a tank which is adjacent to the reaction tank and has plasma generating function. CONSTITUTION:A circular transparent antisticking plate 14 is provided near to the light incident window 7 in the inside of the reaction tank 1 and enabled to transfer to the inside of a plasma generating chamber 10 adjacent to the reaction tank 1 by a motor 17. When the deposition of a thin film is performed on a base plate plate 14 by means of optical CVD (chemical vapor deposition) in the inside of the reaction chamber 1 and a deposit is deposited on the under side of the circular plate 14, the stuck face is introduced into the plasma generating chamber 10 by the motor 17. Therein the deposit is allowed to react with ionized gas and the removal of the deposit is easily performed and it is made so that the face always free from the deposit exists under the light introduction window 7. Thereby the stable film formation can be performed for a long period and also an excellent film less in the mixing of the impurities is obtained.
|
