Controlled vacuum arc material deposition, method and apparatus

摘要

A method and apparatus for vacuum arc deposition of material on a surface of an object uses a vacuum chamber accommodating the active surface of the cathode and an anode. A power supply connected to the anode and cathode establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet that is moved in a closed path relative to the cathode. A solenoid modifies the main magnetic field produced on the active surface of the cathode.