| 摘要 |
<p>A method of manufacturing color filters is disclosed. In this method, a photosensitive film (19), which is used for forming a filter element, is formed on a substrate (11). A photomask (20) with a given pattern is placed above the photoresistive film (19). Under this condition, the photomas- ked-film is subjected to the first exposure process. The pho- tomask (19) is then moved in the stripe-extending direction of a given stripe pattern. Following the second exposure process, developing, dyeing and dyeing-preventing processes are performed for color filter element formation. The abovementioned process is performed for each filter element for a specified color.</p> |
