| 摘要 |
PURPOSE:To obtain a uniform pattern by detecting in advance the thickness and the refractive index of a photosensitizer layer of an element to be exposed before exposing, calculating an emitting exposure amount for maintaining an effective exposure amount constant on the basis of the detected results, and controlling the emitting exposure amount to the element to be exposed. CONSTITUTION:When an element 1 to be exposed is emitted by an incident polarized light 12 of linear polarized light at an incident angle theta, the light 12 is reflected on the surface of the element 1 to be exposed to cause the polarized state to alter. The light is incident as reflected polarized light 13 to a polarization measuring unit 4. Phase difference delta and reflection counting ratio angle psi of the measured results of the unit 4 are fed to a refractive index film thickness calculating mechanism 5, which are used together with a wavelength lambda, the incident angle theta and refractive indexes n0, n1 of a medium 14 and the element 1 to be exposed, input in advance to calculate the refractive index (n) and the thickness (d) of a photosensitizer layer 11. Data of the refractive index (n) and the thickness (d) calculated by the mechanism 5 are fed to an emitting exposure amount calculating and controlling mechanism 6, which calculates an emitting exposure amount that the effective exposure amount becomes constant.
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