发明名称 MEASUREMENT OF TOTAL REFLECTION INFRARED SPECTRUM AND MEASURING PRISM THEREFOR
摘要 <p>PURPOSE:To enable the infrared spectrum of the uppermost surface layer of a specimen to be measured by bringing the evaporated film for an infrared total reflection that is formed on the infrared ray reflecting surface of a prism into close contact with the specimen and measuring a total reflection infrared spectrum. CONSTITUTION:A specimen 3 is disposed in a specimen chamber 4 and a prism 1 is brought into close contact with the specimen 3 via an evaporated film 2. Infrared rays 6a from a light source 6, after being modulated by a Michelson interferometer 5, enter into the prism 1 in the specimen chamber 4 via one end surface of the prism 1. Then, a reflection is repeated several times between the evaporated film 2 and an upper surface opposite thereto. Thereafter, the infrared rays 6a are emitted to outside from the other end surface of the prism 1 and reflected by two reflecting mirrors 7 to enter a detector 8. Signals from the detector 8 are arithmetically processed by a Fourier transformation processor 9. Thus, not only a good infrared spectrum is obtained but also, by increasing the thickness of the evaporated film 2, only the uppermost surface layer of the specimen 3 can be measured.</p>
申请公布号 JPS62132132(A) 申请公布日期 1987.06.15
申请号 JP19850271357 申请日期 1985.12.04
申请人 HITACHI LTD 发明人 EGUCHI KINYA;NIITSUMA KIKUE
分类号 G01J3/14 主分类号 G01J3/14
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