发明名称 SUBSTRATE FOR THIN FILM MAGNETIC HEAD AND MANUFACTURE OF THE SAME
摘要 PURPOSE:To manufacture a substrate for head which provides friction resistance and sliding characteristic by selecting the optimum amount of Al2O3. CONSTITUTION:Aluminum oxide (Al2O3) of 1-40wt%, silicon oxide (SiO2) of 1-3wt% and Fe2O2, Cr2O3, MnO2 and a kind or two or more kinds of rare earth oxides of 0.2-2wt% are added to the main elements consisting of zirconium oxide (ZrO2) of 80-94mol% and yttrium oxide (Y2O3) of 6-20mol%. A substrate having high friction resistance and sliding characteristic can be manufactured by selecting optimum amount of Al2O3 within the range of 1-40wt%.
申请公布号 JPS6077406(A) 申请公布日期 1985.05.02
申请号 JP19830185495 申请日期 1983.10.04
申请人 HITACHI KINZOKU KK 发明人 YAMADA HIROHIDE;KOIKE YOSHIHARU
分类号 C04B35/48;G11B5/31;H01F10/26;H01F10/28 主分类号 C04B35/48
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